- Conference date: 11–15 May 2009
- Location: Albany (New York)
This work presents an as exhaustive as possible review of methods which can be applied for in‐line monitoring of implant processes. The dynamic of each technique was evaluated for several typical applications. This review shows that methods which are sensitive to electrically active dopants with the presence of a PN junction (post annealing metrology only) are quite well correlated and show a 1 to 1 dynamic. Indirect methods which can be used either pre or/and post anneal are more case to case metrologies with dynamics changing with the characteristics of implant.
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