Evolution of Ion Implantation Technology and its Contribution to Semiconductor Industry
- Conference date: 6–11 June 2010
- Location: Kyoto, (Japan)
Industrial aspects of the evolution of ion implantation technology will be reviewed, and their impact on the semiconductor industry will be discussed. The main topics will be the technology’s application to the most advanced, ultra scaled CMOS, and to power devices, as well as productivity improvements in implantation technology. Technological insights into future developments in ion‐related technologies for emerging industries will also be presented.
- High current technology
- Ion implantation
- Metal insulator semiconductor structures
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