- Conference date: 15–20 August 2010
- Location: Chicago, Illinois, (USA)
A multilayer Laue lens (MLL) made from has been fabricated aiming at a sub‐10‐nm spatial resolution for hard x‐ray microscopy. A multilayer of 1000 alternating and Si layers with a layer thickness gradually increasing from 5 nm to 316 nm according to the Fresnel lens structure was deposited on a silicon substrate using DC magnetron sputtering, and then the substrate was diced, polished and thinned. The multilayer total thickness was about 10 μm. Optical properties were measured at the SPring‐8 beamline BL24XU using 20‐keV x‐rays. While observing changes in far‐field diffraction patterns by changing the tilt angle of the MLL, a dynamical diffraction effect of the MLL was visually confirmed. The achieved line focusing size was 13.1 nm, which is the best ever reported by using an MLL. The maximum local diffraction efficiency was measured to be 62%. Further, two MLLs were arranged in the KB configuration and applied to scanning transmission microscopy.
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