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Oxidized treatment of high Tc superconducting thin films by plasma‐ion doping technique
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10.1063/1.39053
/content/aip/proceeding/aipcp/10.1063/1.39053
http://aip.metastore.ingenta.com/content/aip/proceeding/aipcp/10.1063/1.39053
/content/aip/proceeding/aipcp/10.1063/1.39053
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/content/aip/proceeding/aipcp/10.1063/1.39053
1990-01-25
2015-02-28
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229c8a00d8fe88cf152414eb5d9cd803 conferences.conference_paperzxybnytfddd
Scitation: Oxidized treatment of high Tc superconducting thin films by plasma‐ion doping technique
http://aip.metastore.ingenta.com/content/aip/proceeding/aipcp/10.1063/1.39053
10.1063/1.39053
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