- Conference date: 8−10 May 1991
- Location: Clearwater, Florida (USA)
Since the fabrication of photonic devices is a complex and expensive process it is highly desirable to characterize both starting material and device structures after each step of technological process. The ideal candidate which meets the production and research criteria is photoluminescence mapping technique. In this paper we describe apparatus for measuring photoluminescence over the entire wafer and discuss a number of applications of this technique.
- Materials fabrication
- Optical fabrication
- Optical materials
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