Skip to main content
banner image
The effect of channeling on the defect depth distribution in 110 keV Rb implanted poly‐W
USD
/content/aip/proceeding/aipcp/10.1063/1.45547
http://aip.metastore.ingenta.com/content/aip/proceeding/aipcp/10.1063/1.45547
/content/aip/proceeding/aipcp/10.1063/1.45547
Loading

Data & Media loading...

Loading

Article metrics loading...

/content/aip/proceeding/aipcp/10.1063/1.45547
1994-06-15
2016-05-02

Access Key

  • FFree Content
  • OAOpen Access Content
  • SSubscribed Content
  • TFree Trial Content
229c8a00d8fe88cf152414eb5d9cd803 conferences.conference_paperzxybnytfddd