Laser produced plasma for efficient extreme ultraviolet light sources
- Conference date: 19–22 July 2011
- Location: Belfast, Northern Ireland, UK
Extreme ultraviolet emission from laser produced plasma and their relevance to EUV source development is discussed. The current state of the field for Sn LPP sources operating at 13.5 nm is described and initial results are given for EUV emission from CO2 laser irradiation of a bulk Sn target. A maximum conversion efficiency of 1.7% has been measured and the influence of the CO2 laser temporal profile on the CE is discussed. A double pulse irradiation scheme is shown to increase CE up to a maximum value of 2.1% for an optimum prepulse - pulse delay of 150 ns. The emergence of a new EUVL source wavelength at 6.7 nm based on Gd and Tb LPPs has been outlined. An initial experiment investigating picosecond laser irradiation as a means to produce strong 6.7 nm emission from a Gd2O3 target has been performed and verified.
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