1887
banner image
Plasma immersion ion implantation for sub-22 nm node devices: FD-SOI and Tri-Gate
Rent:
Rent this article for
USD
10.1063/1.4766492
    + View Affiliations - Hide Affiliations
    Affiliations:
    1 IBS, ZI Peynier-Rousset, Avenue Gaston Imbert prolongée, 13 790 Peynier, France and CEA, LETI, MINATEC Campus, 17 rue des Martyrs, 38054 GRENOBLE Cedex 9, France
    2 CEA, LETI, MINATEC Campus, 17 rue des Martyrs, 38054 GRENOBLE Cedex 9, France
    3 STMicroelectronics, 850, rue J. Monnet, 38926 Crolles, France
    4 CEA, LETI, MINATEC Campus, 17 rue des Martyrs, 38054 GRENOBLE Cedex 9, France
    5 IBS, ZI Peynier-Rousset, Avenue Gaston Imbert prolongée, 13 790 Peynier, France
    AIP Conf. Proc. 1496, 71 (2012); http://dx.doi.org/10.1063/1.4766492
  • Conference date: 25–29 June 2012
  • Location: Valladolid, Spain
Loading

Article metrics loading...

/content/aip/proceeding/aipcp/10.1063/1.4766492
2012-11-06
2014-04-17
This is a required field
Please enter a valid email address
229c8a00d8fe88cf152414eb5d9cd803 conferences.conference_paperzxybnytfddd
Scitation: Plasma immersion ion implantation for sub-22 nm node devices: FD-SOI and Tri-Gate
http://aip.metastore.ingenta.com/content/aip/proceeding/aipcp/10.1063/1.4766492
10.1063/1.4766492
SEARCH_EXPAND_ITEM