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Plasma immersion ion implantation for sub-22 nm node devices: FD-SOI and Tri-Gate
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/content/aip/proceeding/aipcp/10.1063/1.4766492
http://aip.metastore.ingenta.com/content/aip/proceeding/aipcp/10.1063/1.4766492
/content/aip/proceeding/aipcp/10.1063/1.4766492
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/content/aip/proceeding/aipcp/10.1063/1.4766492
2012-11-06
2016-05-29

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229c8a00d8fe88cf152414eb5d9cd803 conferences.conference_paperzxybnytfddd
/content/realmedia?fmt=ahah&adPositionList=
&advertTargetUrl=//oascentral.aip.org/RealMedia/ads/&sitePageValue=proceedings.aip.org/1496/10.1063/1.4766492&pageURL=http://scitation.aip.org/content/aip/proceeding/aipcp/10.1063/1.4766492'
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