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Effects of implant temperature and millisecond annealing on dopant activation and diffusion
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/content/aip/proceeding/aipcp/10.1063/1.4766498
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/content/aip/proceeding/aipcp/10.1063/1.4766498
2012-11-06
2016-05-01

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229c8a00d8fe88cf152414eb5d9cd803 conferences.conference_paperzxybnytfddd