Effect of composition ratio and annealing on morphology and optical properties of a-CNx thin films
- Conference date: 19–21 November 2012
- Location: Colmar Tropicale, Bukit Tinggi, Pahang, Malaysia
Amorphous carbon nitride (a-CNx) thin films were deposited by radio frequency plasma enhanced chemical vapor deposition (rf-PECVD) technique. A set of a-CNx thin films were prepared using pure methane ( ) gas diluted with nitrogen ( ) gas. The to flow rate ratios calculated as were varied at 20, 30, 50, 60 and 70 %. These samples were then annealed at 400 °C in a quartz tube furnace in argon (Ar) gas. The effects of dilution and thermal annealing on the structural and optical properties of these samples were studied. A surface profilometer was used to measure film thickness. A field emission scanning electron microscopy (FESEM) and a ultraviolet-visible spectrophotometer (UV-Vis) measurements were used to determine their structural and optical properties, respectively. The thickness of the as-deposited films decreased with increased composition ratio. However, the thickness increased when these films were annealed. The FESEM images showed that the grain size of as-deposited and annealed films increased with the increased of composition ratios. But the the grain size decreased with a more orderly arrangement after the annealing process. The energy gap (Eg) of the both set films increased with the increase in composition ratio up to 50% and significantly decreased with further increased in composition ratio. However, Eg is decreased when the films were annealed. The variations in the thickness and optical properties of these CNx films when annealed relate to modifications in the film structure.
- Optical properties
- Thin film deposition
- Thin film structure
- Thin film composition
- Thin film morphology
- Chemical vapor deposition
- Plasma chemical vapor deposition
- Plasma materials processing
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