- Conference date: 24−28 Apr 1995
- Location: Osaka, Japan
Evaluation of the x‐ray reflectivity and the effects of thermal annealing on both reflectivity and the layered structures of Mo‐based and W‐based multilayers showed that the x‐ray reflectivities and periodic lengths of Mo/Si, Mo/B, W/Si, W/B, and W/LiF multilayers markedly decreased after annealing at around 400 °C in Ar atmosphere for one hour, whereas the reflectivity of Mo/SiC, Mo/C, Mo/B4C, Mo/BN, MoSi2/Si, Mo 5Si3/Si, W/C, W/B4C, and W/BN multilayers changed only slightly. Transmission electron microscopy revealed that the thermally induced deterioration in the layered structures of the Mo/SiC, Mo/B4C, Mo/BN, MoSi2/Si, and Mo 5Si3/Si multilayers was smaller than that in the Mo/Si and Mo/B multilayers. In addition, the deterioration of the layered structures of the W/C, W/B4C, and W/BN multilayers was smaller than that in the W/Si, W/B, and W/LiF multilayers. These results suggest that Mo/SiC, Mo/C, Mo/B4C, Mo/BN, and MoSi2/Si, and Mo 5Si3/Si multilayers are superior to a Mo/Si multilayer in terms of thermal stability. These results also suggest that W/C, W/B4C, and W/BN multilayers are superior to other W‐based multilayers in terms of thermal stability. Therefore, Mo/SiC, Mo/C, Mo/B4C, Mo/BN, Mo‐silicide/Si, W/C, W/B4C, and W/BN multilayers are suitable for use as reflectors in applications using high‐brilliance soft x‐ray.
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