- Conference date: 19−23 Sep 1994
- Location: Cancun (Mexico)
The use of well defined γ‐Al2O3 thin films enables the use of the surface sensitive ultraviolet photoelectron spectroscopy (UPS) for an absolute determination of the work function Φ. Thereby, the changes in the surface potential V s and dipole moment χ are determined also. We find these values to change characteristic upon variation of annealing temperature and after chemical modification by Mo, and Mo‐ Ni, impregnation of the γ‐Al2O3 substrate. From variations of the surface potential of these films, we determine the amount and influence of Al and oxygen vacancies at the surface. We find that the mobility is blocked by the Mo modification, but is enhanced by the Ni modification. The corresponding dipole contributions are explained by relative displacements of surface OH groups.
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