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Detecting large particles in a slurry by measuring acoustic cavitation thresholds
1.Apfel, R. E. , and Holland, C. K. (1991). “Gauging the likelihood of cavitation from short pulse, low duty cycle diagnostic ultrasound,” Ultrasound Med. Biol. 17, 179–185.
2.Babu, S. V., Hariharaputhiran, M., Ramarajan, S., Her, Y., and Mayton, M. (1998). “The role of particulate properties in the CMP of copper,” CMP-MIC Proceedings, p. 121.
3.Doyen, L., Vacher, D., Tarutani, K., Bouard, P., Picore, F., and Girard, D. (2002). “Analyzing Large Particles in CMP Slurries,” Semicond. Int., August.
4.Hattori, T. (1998). Ultraclean Surface Processing of Semiconductor Wafers (Springer, Berlin).
5.Heuter, T., and Bolt, R. (2000). Sonics (Acoustical Society of America, New York).
6.Madanshetty, S. I. (1995). “A conceptual model for acoustic microcavitation,” J. Acoust. Soc. Am. 98, 2681–2689.
7.Neppiras, E. A. (1980). “Acoustic cavitation,” Phys. Rep. 61, 160–251.
8.Phol, M. C. , and Griffiths, D. C. (1996). “The importance of particle size to the performance of the abrasive particle in the CMP process,” J. Electron. Mater. 25, 1612–1618.
9.Shon-Roy, L. (ed.) (1999). Chemical Mechanical Planarization (ICE, Scottsdale, AZ).
10.Vasilopoulos, G., Lin Z., and Adrian, K. (2000). “Techniques for evaluating particles in CMP slurries,” Mykrolis Application Note MAL120.
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