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Deposition rate dependence of the critical optimization temperature for thin film properties: Evidence for the disordered area reevaporation mechanism
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10.1116/1.571877
/content/avs/journal/jvst/21/4/10.1116/1.571877
http://aip.metastore.ingenta.com/content/avs/journal/jvst/21/4/10.1116/1.571877
/content/avs/journal/jvst/21/4/10.1116/1.571877
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/content/avs/journal/jvst/21/4/10.1116/1.571877
1982-11-01
2014-10-30
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Deposition rate dependence of the critical optimization temperature for thin film properties: Evidence for the disordered area reevaporation mechanism
http://aip.metastore.ingenta.com/content/avs/journal/jvst/21/4/10.1116/1.571877
10.1116/1.571877
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