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ISSN: 0734-2101
E-ISSN: 1520-8559

Journal of Vacuum Science & Technology A publishes reports of original research, letters, and review articles that focus on fundamental scientific understanding of interfaces, surfaces, plasmas and thin films and on using this understanding to advance the state-of-the-art in various technological applications.

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Editor's Picks

  • Overview of atomic layer etching in the semiconductor industry
  • <span class=In situ process monitoring during multistage coevaporation of CuZnSnS thin films" title=" process monitoring during multistage coevaporation of CuZnSnS thin films" />
  • Properties of reactively sputtered oxygenated cadmium sulfide (CdS:O) and their impact on CdTe solar cell performance
  • Atomic layer deposition of magnesium fluoride via bis(ethylcyclopentadienyl)magnesium and anhydrous hydrogen fluoride
  • Atomic layer deposited lithium aluminum oxide: (In)dependency of film properties from pulsing sequence

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ISSN: 0734-2101
E-ISSN: 1520-8559

Agency: AVS: Science & Technology of Materials, Interfaces, and Processing

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Scitation: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
http://aip.metastore.ingenta.com/content/avs/journal/jvsta
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