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ISSN: 0734-2101
E-ISSN: 1520-8559

Journal of Vacuum Science & Technology A publishes reports of original research, letters, and review articles that focus on fundamental scientific understanding of interfaces, surfaces, plasmas and thin films and on using this understanding to advance the state-of-the-art in various technological applications.

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Editor's Picks

  • Thermal atomic layer etching of crystalline aluminum nitride using sequential, self-limiting hydrogen fluoride and Sn(acac)2 reactions and enhancement by H2 and Ar plasmas
  • Structure and optical band gaps of (Ba,Sr)SnO3 films grown by molecular beam epitaxy
  • Gas cluster ion beam for the characterization of organic materials in submarine basalts as Mars analogs
  • Fluorocarbon based atomic layer etching of Si3N4 and etching selectivity of SiO2 over Si3N4