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image of Journal of Vacuum Science & Technology A
ISSN: 0734-2101
E-ISSN: 1520-8559

Journal of Vacuum Science & Technology A publishes reports of original research, letters, and review articles that focus on fundamental scientific understanding of interfaces, surfaces, plasmas and thin films and on using this understanding to advance the state-of-the-art in various technological applications.

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Editor's Picks

  • Vapor deposition of copper(I) bromide films via a two-step conversion process
  • Surface oxidation of the topological insulator Bi2Se3
  • Band alignments between SmTiO3, GdTiO3, and SrTiO3
  • Growth and electronic properties of Tb silicide layers on Si(111)
  • Thermal atomic layer etching of crystalline aluminum nitride using sequential, self-limiting hydrogen fluoride and Sn(acac)2 reactions and enhancement by H2 and Ar plasmas