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ISSN: 0734-2101
E-ISSN: 1520-8559

Journal of Vacuum Science & Technology A publishes reports of original research, letters, and review articles that focus on fundamental scientific understanding of interfaces, surfaces, plasmas and thin films and on using this understanding to advance the state-of-the-art in various technological applications.

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Editor's Picks

  • Application of nitrogen plasma immersion ion implantation to titanium nasal implants with nanonetwork surface structure
  • Impact of reduced graphene oxide on MoS2 grown by sulfurization of sputtered MoO3 and Mo precursor films
  • In situ metrology to characterize water vapor delivery during atomic layer deposition
  • Cross-sectional scanning tunneling microscopy of antiphase boundaries in epitaxially grown GaP layers on Si(001)
  • Implementation of atomic layer etching of silicon: Scaling parameters, feasibility, and profile control