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In situ pulsed laser‐induced thermal desorption studies of the silicon chloride surface layer during silicon etching in high density plasmas of Cl2 and Cl2/O2 mixtures
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10.1116/1.579082
/content/avs/journal/jvsta/12/5/10.1116/1.579082
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/12/5/10.1116/1.579082
/content/avs/journal/jvsta/12/5/10.1116/1.579082
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/content/avs/journal/jvsta/12/5/10.1116/1.579082
1994-09-01
2015-09-01
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Insitu pulsed laser‐induced thermal desorption studies of the silicon chloride surface layer during silicon etching in high density plasmas of Cl2 and Cl2/O2 mixtures
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/12/5/10.1116/1.579082
10.1116/1.579082
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