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Chemical dry etching of silicon nitride and silicon dioxide using CF4/O2/N2 gas mixtures
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10.1116/1.580203
/content/avs/journal/jvsta/14/5/10.1116/1.580203
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/14/5/10.1116/1.580203
/content/avs/journal/jvsta/14/5/10.1116/1.580203
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/content/avs/journal/jvsta/14/5/10.1116/1.580203
1996-09-01
2014-07-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Chemical dry etching of silicon nitride and silicon dioxide using CF4/O2/N2 gas mixtures
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/14/5/10.1116/1.580203
10.1116/1.580203
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