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Endpoint prediction for polysilicon plasma etch via optical emission interferometry
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10.1116/1.580550
/content/avs/journal/jvsta/15/3/10.1116/1.580550
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/15/3/10.1116/1.580550
/content/avs/journal/jvsta/15/3/10.1116/1.580550
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/content/avs/journal/jvsta/15/3/10.1116/1.580550
1997-05-01
2014-09-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Endpoint prediction for polysilicon plasma etch via optical emission interferometry
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/15/3/10.1116/1.580550
10.1116/1.580550
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