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Hole-size dependent highly selective etching with a hexthode-type wide-gap plasma etcher
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10.1116/1.580688
/content/avs/journal/jvsta/15/3/10.1116/1.580688
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/15/3/10.1116/1.580688
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/content/avs/journal/jvsta/15/3/10.1116/1.580688
1997-05-01
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Hole-size dependent highly selective SiO2 etching with a hexthode-type wide-gap plasma etcher
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/15/3/10.1116/1.580688
10.1116/1.580688
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