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Surface processes occurring on and in fluorine-based plasmas. Reactive ion etching in plasmas
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10.1116/1.580897
/content/avs/journal/jvsta/15/6/10.1116/1.580897
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/15/6/10.1116/1.580897
/content/avs/journal/jvsta/15/6/10.1116/1.580897
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/content/avs/journal/jvsta/15/6/10.1116/1.580897
1997-11-01
2014-11-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Surface processes occurring on TiSi2 and CoSi2 in fluorine-based plasmas. Reactive ion etching in CF4/CHF3 plasmas
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/15/6/10.1116/1.580897
10.1116/1.580897
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