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Integration of fluorinated amorphous carbon as low-dielectric constant insulator: Effects of heating and deposition of tantalum nitride
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10.1116/1.581968
/content/avs/journal/jvsta/17/5/10.1116/1.581968
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/17/5/10.1116/1.581968
/content/avs/journal/jvsta/17/5/10.1116/1.581968
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/content/avs/journal/jvsta/17/5/10.1116/1.581968
1999-09-01
2014-10-30
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Integration of fluorinated amorphous carbon as low-dielectric constant insulator: Effects of heating and deposition of tantalum nitride
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/17/5/10.1116/1.581968
10.1116/1.581968
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