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Deposition and 1.54 μm luminescent properties of erbium-doped hydrogenated amorphous silicon thin films by electron cyclotron resonance plasma enhanced chemical vapor deposition of with concurrent sputtering of erbium
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10.1116/1.582047
/content/avs/journal/jvsta/17/6/10.1116/1.582047
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/17/6/10.1116/1.582047
/content/avs/journal/jvsta/17/6/10.1116/1.582047
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/content/avs/journal/jvsta/17/6/10.1116/1.582047
1999-11-01
2015-07-07
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Deposition and 1.54 μm Er3+ luminescent properties of erbium-doped hydrogenated amorphous silicon thin films by electron cyclotron resonance plasma enhanced chemical vapor deposition of SiH4 with concurrent sputtering of erbium
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/17/6/10.1116/1.582047
10.1116/1.582047
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