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Nanoscratch characterization of dual-ion-beam deposited C-doped boron nitride films
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10.1116/1.582064
/content/avs/journal/jvsta/17/6/10.1116/1.582064
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/17/6/10.1116/1.582064
/content/avs/journal/jvsta/17/6/10.1116/1.582064
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/content/avs/journal/jvsta/17/6/10.1116/1.582064
1999-11-01
2014-10-02
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Nanoscratch characterization of dual-ion-beam deposited C-doped boron nitride films
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/17/6/10.1116/1.582064
10.1116/1.582064
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