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High aspect ratio etching with high resist selectivity improved by addition of organosilane to tetrafluoroethyl trifluoromethyl ether
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10.1116/1.582132
/content/avs/journal/jvsta/18/1/10.1116/1.582132
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/18/1/10.1116/1.582132
/content/avs/journal/jvsta/18/1/10.1116/1.582132
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/content/avs/journal/jvsta/18/1/10.1116/1.582132
2000-01-01
2014-11-26
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: High aspect ratio SiO2 etching with high resist selectivity improved by addition of organosilane to tetrafluoroethyl trifluoromethyl ether
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/18/1/10.1116/1.582132
10.1116/1.582132
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