1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Generation of positively charged particles at an anode and transport to device wafers in a real radio frequency plasma etching chamber for tungsten etch-back process
Rent:
Rent this article for
USD
10.1116/1.582341
/content/avs/journal/jvsta/18/4/10.1116/1.582341
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/18/4/10.1116/1.582341
Loading

Article metrics loading...

/content/avs/journal/jvsta/18/4/10.1116/1.582341
2000-07-01
2014-04-19
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Generation of positively charged particles at an anode and transport to device wafers in a real radio frequency plasma etching chamber for tungsten etch-back process
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/18/4/10.1116/1.582341
10.1116/1.582341
SEARCH_EXPAND_ITEM