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Remote-plasma-enhanced reaction between a silicon surface and trifluoro-acetyl-fluoride gas
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10.1116/1.1326942
/content/avs/journal/jvsta/19/1/10.1116/1.1326942
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/19/1/10.1116/1.1326942
/content/avs/journal/jvsta/19/1/10.1116/1.1326942
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/content/avs/journal/jvsta/19/1/10.1116/1.1326942
2001-01-01
2015-05-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Remote-plasma-enhanced reaction between a silicon surface and trifluoro-acetyl-fluoride gas
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/19/1/10.1116/1.1326942
10.1116/1.1326942
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