1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
The full text of this article is not currently available.
Nitridation of thermal films by radio-frequency plasma assisted electron cyclotron resonance: Effect of plasma modes and process parameters
Rent:
Rent this article for
USD
10.1116/1.1331295
/content/avs/journal/jvsta/19/1/10.1116/1.1331295
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/19/1/10.1116/1.1331295
/content/avs/journal/jvsta/19/1/10.1116/1.1331295
Loading

Data & Media loading...

Loading

Article metrics loading...

/content/avs/journal/jvsta/19/1/10.1116/1.1331295
2001-01-01
2014-11-21
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Nitridation of thermal SiO2 films by radio-frequency plasma assisted electron cyclotron resonance: Effect of plasma modes and process parameters
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/19/1/10.1116/1.1331295
10.1116/1.1331295
SEARCH_EXPAND_ITEM