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Nitridation of thermal films by radio-frequency plasma assisted electron cyclotron resonance: Layer structure and composition
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10.1116/1.1333084
/content/avs/journal/jvsta/19/1/10.1116/1.1333084
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/19/1/10.1116/1.1333084
/content/avs/journal/jvsta/19/1/10.1116/1.1333084
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/content/avs/journal/jvsta/19/1/10.1116/1.1333084
2001-01-01
2015-01-29
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Nitridation of thermal SiO2 films by radio-frequency plasma assisted electron cyclotron resonance: Layer structure and composition
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/19/1/10.1116/1.1333084
10.1116/1.1333084
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