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Fluorinated–chlorinated films prepared at low temperature by remote plasma-enhanced chemical-vapor deposition using mixtures of and
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10.1116/1.1349199
/content/avs/journal/jvsta/19/2/10.1116/1.1349199
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/19/2/10.1116/1.1349199
/content/avs/journal/jvsta/19/2/10.1116/1.1349199
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/content/avs/journal/jvsta/19/2/10.1116/1.1349199
2001-03-01
2015-08-03
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Fluorinated–chlorinated SiO2 films prepared at low temperature by remote plasma-enhanced chemical-vapor deposition using mixtures of SiF4 and SiCl4
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/19/2/10.1116/1.1349199
10.1116/1.1349199
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