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Effect of film density on electrical properties of indium tin oxide films deposited by dc magnetron reactive sputtering
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10.1116/1.1371326
/content/avs/journal/jvsta/19/5/10.1116/1.1371326
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/19/5/10.1116/1.1371326
/content/avs/journal/jvsta/19/5/10.1116/1.1371326
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/content/avs/journal/jvsta/19/5/10.1116/1.1371326
2001-09-01
2014-12-28
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Effect of film density on electrical properties of indium tin oxide films deposited by dc magnetron reactive sputtering
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/19/5/10.1116/1.1371326
10.1116/1.1371326
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