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Relationship of etch reaction and reactive species flux in plasma for selective etching over Si and
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10.1116/1.1376709
/content/avs/journal/jvsta/19/5/10.1116/1.1376709
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/19/5/10.1116/1.1376709
/content/avs/journal/jvsta/19/5/10.1116/1.1376709
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/content/avs/journal/jvsta/19/5/10.1116/1.1376709
2001-09-01
2014-12-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Relationship of etch reaction and reactive species flux in C4F8/Ar/O2 plasma for SiO2 selective etching over Si and Si3N4
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/19/5/10.1116/1.1376709
10.1116/1.1376709
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