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Silicon etching yields in and HBr high density plasmas
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10.1116/1.1378077
/content/avs/journal/jvsta/19/5/10.1116/1.1378077
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/19/5/10.1116/1.1378077
/content/avs/journal/jvsta/19/5/10.1116/1.1378077
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/content/avs/journal/jvsta/19/5/10.1116/1.1378077
2001-09-01
2015-03-04
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Silicon etching yields in F2,Cl2,Br2, and HBr high density plasmas
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/19/5/10.1116/1.1378077
10.1116/1.1378077
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