1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Mechanical and etching properties of dual ion beam deposited hydrogen-free silicon nitride films
Rent:
Rent this article for
USD
10.1116/1.1392397
/content/avs/journal/jvsta/19/5/10.1116/1.1392397
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/19/5/10.1116/1.1392397
Loading

Article metrics loading...

/content/avs/journal/jvsta/19/5/10.1116/1.1392397
2001-09-01
2014-04-23
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Mechanical and etching properties of dual ion beam deposited hydrogen-free silicon nitride films
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/19/5/10.1116/1.1392397
10.1116/1.1392397
SEARCH_EXPAND_ITEM