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Influence of standing-wave electric field pattern on the laser damage resistance of thin films
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10.1116/1.1460892
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    Affiliations:
    1 Istituto Nazionale di Fisica della Materia, INFM, Dipartimento di Fisica, Università di Lecce, 73100 Lecce, Italy
    2 Istituto Nazionale di Fisica della Materia, INFM, Dipartimento di Scienza dei Materiali, Università di Lecce, 73100 Lecce, Italy
    3 Istituto Nazionale di Fisica della Materia, INFM, Dipartimento di Fisica, Università di Lecce, 73100 Lecce, Italy
    4 Istituto Nazionale di Fisica della Materia, INFM, Dipartimento di Scienza dei Materiali, Università di Lecce, 73100 Lecce, Italy
    5 Istituto Nazionale di Fisica della Materia, INFM, Dipartimento di Fisica, Università di Lecce, 73100 Lecce, Italy
    6 ENEA, Thin Film Optics Laboratory, Via Anguillarese 301, 00060 Roma, Italy
    J. Vac. Sci. Technol. A 20, 643 (2002); http://dx.doi.org/10.1116/1.1460892
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/content/avs/journal/jvsta/20/3/10.1116/1.1460892
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/content/avs/journal/jvsta/20/3/10.1116/1.1460892
2002-05-07
2014-12-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Influence of standing-wave electric field pattern on the laser damage resistance of HfO2 thin films
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/20/3/10.1116/1.1460892
10.1116/1.1460892
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