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Effect of carbon enrichment induced by photoresist on highly selective etching
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10.1116/1.1517255
/content/avs/journal/jvsta/20/6/10.1116/1.1517255
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/20/6/10.1116/1.1517255
/content/avs/journal/jvsta/20/6/10.1116/1.1517255
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/content/avs/journal/jvsta/20/6/10.1116/1.1517255
2002-11-06
2014-11-27
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Effect of carbon enrichment induced by photoresist on highly selective SiO2 etching
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/20/6/10.1116/1.1517255
10.1116/1.1517255
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