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Effect of neutral transport on the etch product lifecycle during plasma etching of silicon in chlorine gas
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10.1116/1.1527952
/content/avs/journal/jvsta/21/1/10.1116/1.1527952
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/21/1/10.1116/1.1527952
/content/avs/journal/jvsta/21/1/10.1116/1.1527952
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/content/avs/journal/jvsta/21/1/10.1116/1.1527952
2002-12-02
2014-10-26
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Effect of neutral transport on the etch product lifecycle during plasma etching of silicon in chlorine gas
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/21/1/10.1116/1.1527952
10.1116/1.1527952
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