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Characterization of nonstoichiometric and thin films stabilized by and additions
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10.1116/1.1622675
/content/avs/journal/jvsta/21/6/10.1116/1.1622675
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/21/6/10.1116/1.1622675
/content/avs/journal/jvsta/21/6/10.1116/1.1622675
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/content/avs/journal/jvsta/21/6/10.1116/1.1622675
2003-10-24
2014-08-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Characterization of nonstoichiometric TiO2 and ZrO2 thin films stabilized by Al2O3 and SiO2 additions
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/21/6/10.1116/1.1622675
10.1116/1.1622675
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