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Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
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10.1116/1.1624285
/content/avs/journal/jvsta/22/1/10.1116/1.1624285
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/22/1/10.1116/1.1624285
/content/avs/journal/jvsta/22/1/10.1116/1.1624285
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/content/avs/journal/jvsta/22/1/10.1116/1.1624285
2003-11-13
2014-10-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/22/1/10.1116/1.1624285
10.1116/1.1624285
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