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Properties of inductively coupled plasmas. I. Studies of magnetically confined plasmas for etching of
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10.1116/1.1697482
/content/avs/journal/jvsta/22/3/10.1116/1.1697482
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/22/3/10.1116/1.1697482
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/content/avs/journal/jvsta/22/3/10.1116/1.1697482
2004-04-27
2014-08-29
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Properties of C4F8 inductively coupled plasmas. I. Studies of Ar/c-C4F8 magnetically confined plasmas for etching of SiO2
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/22/3/10.1116/1.1697482
10.1116/1.1697482
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