1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Ion effects on surface interactions during and plasma processing of a)
a)No proof corrections received from author prior to publication.
Rent:
Rent this article for
USD
10.1116/1.1781180
/content/avs/journal/jvsta/22/5/10.1116/1.1781180
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/22/5/10.1116/1.1781180

Figures

Image of FIG. 1.
FIG. 1.

Experimental fluorescence excitation spectrum of in the molecular beam formed from a plasma. The transition used for all density and reactivity measurements was the vibronic band of the transition.

Image of FIG. 2.
FIG. 2.

Relative LIF intensities of radicals in (circles) and plasmas (triangles) as a function of (a) applied rf power and (b) pressure. Open symbols indicate data taken with a grounded mesh (g.m.) in the path of the molecular beam.

Image of FIG. 3.
FIG. 3.

Spatially resolved 2D ICCD images of the LIF signal for the state (a) in the molecular beam and (b) with a substrate rotated into the path of the molecular beam (laser–surface distance ). The image in (c) is the difference between (a) and (b) and shows only the molecules scattering from the surface. LIF signals with the highest intensity appear as the darkest regions, and lines indicate the location of the molecular and laser beams. All images are on the same intensity scale.

Image of FIG. 4.
FIG. 4.

Cross sections of the LIF images shown in Figs. 3(a) and 3(c) (solid lines). Dashed lines represent the simulation results for with a laser–surface distance of .

Image of FIG. 5.
FIG. 5.

Scatter coefficients for during (a) and (b) plasma processing of . Open symbols represent measurements taken with a grounded mesh in the path of the molecular beam. Values are the averages of multiple data sets taken over a two year time period.

Image of FIG. 6.
FIG. 6.

Plasma-ion mass spectra of ions from (a) a plasma molecular beam, and (b) a plasma molecular beam under normal (solid line) and ion-limited conditions (dashed line). Data are normalized to the most intense ion in the spectrum taken without a grounded mesh in the path of the molecular beam.

Image of FIG. 7.
FIG. 7.

High resolution XPS spectra of materials deposited on wafers in the IRIS chamber from (a) and (b) plasmas.

Image of FIG. 8.
FIG. 8.

Relationship between and % crosslinking in materials deposited during and plasma processing. Data shown are for films deposited 8 cm downstream from the coil in independent plasma reactors: plasmas and plasmas, data for films deposited on IRIS substrates are also shown . The line is a linear regression fit to all of the data. Note that for some data points, the horizontal error bars are smaller than the symbol size.

Tables

Generic image for table
TABLE I.

scatter coefficients for FC processing of .a,b

Generic image for table
TABLE II.

Composition of fluorocarbon materials deposited on IRIS substrates.a

Loading

Article metrics loading...

/content/avs/journal/jvsta/22/5/10.1116/1.1781180
2004-09-24
2014-04-19
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Ion effects on CF2 surface interactions during C3F8 and C4F8 plasma processing of Sia)
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/22/5/10.1116/1.1781180
10.1116/1.1781180
SEARCH_EXPAND_ITEM