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Design and performance of a molecular beam epitaxy system for metallic heterostructure deposition illustrated by a study of the controlled epitaxy of
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10.1116/1.1781181
/content/avs/journal/jvsta/22/5/10.1116/1.1781181
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/22/5/10.1116/1.1781181
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Design of the UHV molecular beam epitaxy system.

Image of FIG. 2.
FIG. 2.

In situ RHEED patterns of thick films deposited at at a deposition temperature of (a) , (b) , and (c) . The patterns were acquired at a beam voltage of with the electron beam along the [110] direction.

Image of FIG. 3.
FIG. 3.

Wide angle x-ray diffraction patterns of thick films deposited at at a deposition temperature of (a) , (b) , and (c) . The data were acquired with radiation on a triple axis diffractometer.

Image of FIG. 4.
FIG. 4.

Grazing incidence in-plane diffraction data ( scans) of thick films deposited at at a deposition temperature of (a) , (b) , and (c) .

Image of FIG. 5.
FIG. 5.

tapping mode AFM images of thick films deposited at at a deposition temperature of (a) , (b) , and (c) . The data were acquired at a scan rate of . The extracted surface roughness and crystallite size values are given in the figure.

Image of FIG. 6.
FIG. 6.

Grazing incidence x-ray reflectivity profiles of thick films deposited at at a deposition temperature of (a) , (b) , and (c) . The dotted lines are fits to an optical model. The extracted surface roughness values are given in the figure.

Image of FIG. 7.
FIG. 7.

Deposition temperature dependence of (a) the surface roughness (from the AFM images of Fig. 5 and the GIXR data of Fig. 6); (b) the mean in-plane crystallite size (from the AFM images of Fig. 5), and, (c) the wide angle x-ray diffraction rocking curve FWHM. All of the data are for thick films deposited at .

Image of FIG. 8.
FIG. 8.

In situ RHEED patterns of thick films deposited at ambient temperature at a deposition rate of (a) , (b) , and (c) . The patterns were acquired at a beam voltage of with the electron beam along the [110] direction.

Image of FIG. 9.
FIG. 9.

Grazing incidence x-ray reflectivity profiles of thick films deposited at ambient temperature at deposition rates of (a) , (b) , and (c) . The dotted lines are fits to an optical model. The extracted surface roughness values are given in the figure.

Image of FIG. 10.
FIG. 10.

tapping mode AFM images of thick films deposited at ambient temperature at a deposition rate of (a) , (b) , and (c) . The data were acquired at a scan rate of . The extracted surface roughness and crystallite size values are given in the figure.

Image of FIG. 11.
FIG. 11.

Deposition rate dependence of (a) the surface roughness (from the AFM images of Fig. 10 and the GIXR data of Fig. 9); (b) the mean in-plane crystallite size (from the AFM images of Fig. 10); and (c) the wide angle x-ray diffraction rocking curve FWHM. All of the data are for thick films deposited at ambient temperature.

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/content/avs/journal/jvsta/22/5/10.1116/1.1781181
2004-09-23
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Design and performance of a molecular beam epitaxy system for metallic heterostructure deposition illustrated by a study of the controlled epitaxy of Cu(111)∕Al2O3(0001)
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/22/5/10.1116/1.1781181
10.1116/1.1781181
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