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Atomic layer deposition and characterization of hafnium oxide grown on silicon from tetrakis(diethylamino)hafnium and water vapor
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10.1116/1.1781183
/content/avs/journal/jvsta/22/5/10.1116/1.1781183
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/22/5/10.1116/1.1781183
/content/avs/journal/jvsta/22/5/10.1116/1.1781183
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/content/avs/journal/jvsta/22/5/10.1116/1.1781183
2004-09-23
2014-07-28
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Atomic layer deposition and characterization of hafnium oxide grown on silicon from tetrakis(diethylamino)hafnium and water vapor
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/22/5/10.1116/1.1781183
10.1116/1.1781183
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