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Evolution of local texture and grain morphology in metal plasma immersion ion implantation & deposition of TiN
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10.1116/1.1795828
/content/avs/journal/jvsta/22/6/10.1116/1.1795828
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/22/6/10.1116/1.1795828

Figures

Image of FIG. 1.
FIG. 1.

Schematic drawing of the experimental setup: (a) Geometry for sample perpendicular to the axis of the cathodic arc source; (b) geometry for the sample oriented at 45° to the axis of the cathodic arc. During the application of the high voltage pulses, the plasma sheath expands from less than (without substrate bias) up to at pulses with the ions accelerated along the electric field lines perpendicular to the sheath edge. Between the pulses, ions are arriving at the substrate from the cathode with hypersonic energies around in a broad nearly parallel plasma stream (see Ref. 27 for more details on arc deposition).

Image of FIG. 2.
FIG. 2.

Lateral evolution of TiN texture, obtained from {111} pole figures and measured at 4 different positions from the edge, on a substrate oriented perpendicular after MePIIID. The arrow indicates the direction towards the edge of the sample in the pole figure. The data are plotted as isointensity contour maps.

Image of FIG. 3.
FIG. 3.

TiN {111} pole figures of a sample, oriented at 45° towards the cathode, for 4 different distances from the edge after MePIIID at . The distance from edge is written in the subtitles. The peak positions of maximum intensity, displaying a fourfold symmetry are marked with dots for all four positions. Please note that the relative peak intensity decreases from the edge towards the center.

Image of FIG. 4.
FIG. 4.

TEM bright fields images taken at different magnification in the middle (a) and (b) and in the edge (c) and (d) of sample oriented at 45° and implanted at . The tilt angles are indicated. Please note that the tilt is directed towards the edge for both cases.

Image of FIG. 5.
FIG. 5.

Titanium elemental map from the edge of the sample, obtained by energy filtered TEM [cf. Figs. 4(c) and 4(d)].

Image of FIG. 6.
FIG. 6.

(a) TEM dark field image taken in the center of a sample, oriented at 45°, implanted by MePIIID at , together with (b) corresponding SAD patterns. The calculated diffraction rings for TiN are indicated.

Image of FIG. 7.
FIG. 7.

(a) TEM dark field image taken in the edge of a sample, oriented at 45° after nitrogen MePIIID at together with (b) corresponding SAD patterns.

Tables

Generic image for table
TABLE I.

Texture evolution in the center of the sample as a function of pulse voltage at a fixed duty cycle of 9%.

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/content/avs/journal/jvsta/22/6/10.1116/1.1795828
2004-10-20
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Evolution of local texture and grain morphology in metal plasma immersion ion implantation & deposition of TiN
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/22/6/10.1116/1.1795828
10.1116/1.1795828
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