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Feedback control of chlorine inductively coupled plasma etch processing
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10.1116/1.1861055
/content/avs/journal/jvsta/23/2/10.1116/1.1861055
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/23/2/10.1116/1.1861055
/content/avs/journal/jvsta/23/2/10.1116/1.1861055
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/content/avs/journal/jvsta/23/2/10.1116/1.1861055
2005-02-10
2014-08-31
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Feedback control of chlorine inductively coupled plasma etch processing
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/23/2/10.1116/1.1861055
10.1116/1.1861055
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