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In situ real-time monitoring of profile evolution during plasma etching of mesoporous low-dielectric-constant
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10.1116/1.1865154
/content/avs/journal/jvsta/23/2/10.1116/1.1865154
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/23/2/10.1116/1.1865154
/content/avs/journal/jvsta/23/2/10.1116/1.1865154
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/content/avs/journal/jvsta/23/2/10.1116/1.1865154
2005-03-01
2014-09-03
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: In situ real-time monitoring of profile evolution during plasma etching of mesoporous low-dielectric-constant SiO2
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/23/2/10.1116/1.1865154
10.1116/1.1865154
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