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Wettability and thermal stability of fluorocarbon films deposited by deep reactive ion etching
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10.1116/1.1875232
/content/avs/journal/jvsta/23/3/10.1116/1.1875232
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/23/3/10.1116/1.1875232

Figures

Image of FIG. 1.
FIG. 1.

Dynamic contact angle of ethylene glycol on fluorocarbon film TE09 and base diameter of the droplet as a function of time.

Image of FIG. 2.
FIG. 2.

Deposition rate as a function of gas flow. Coil power is , platen power is , deposition temperature is , and base pressure is .

Image of FIG. 3.
FIG. 3.

Deposition rate as a function of coil power. flow rate is , platen power is , deposition temperature is , and base pressure is .

Image of FIG. 4.
FIG. 4.

Static water contact angles and surface energies of some common used MEMS materials and the fluorocarbon film.

Image of FIG. 5.
FIG. 5.

AFM images of the fluorocarbon film (a) TE10, (b) TE02, and (c) TE09.

Image of FIG. 6.
FIG. 6.

(a) Static contact angles and (b) surface energy of the fluorocarbon film TE02 annealed at various temperatures in air for .

Image of FIG. 7.
FIG. 7.

(a) Static contact angles and (b) surface energy of the three fluorocarbon films as a function of annealing temperature. Annealing time is , in air.

Image of FIG. 8.
FIG. 8.

(a) Static water contact angles and thickness of fluorocarbon film TE02, and (b) decomposition rates of the three films as a function of annealing temperatures. Annealing time is , in air.

Tables

Generic image for table
TABLE I.

Surface tension of four test liquids (Ref. 10).

Generic image for table
TABLE II.

Thickness, contact angle , and surface energies of three fluorocarbon films.

Generic image for table
TABLE III.

Thickness and roughness of three fluorocarbon films chosen.

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/content/avs/journal/jvsta/23/3/10.1116/1.1875232
2005-04-21
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Wettability and thermal stability of fluorocarbon films deposited by deep reactive ion etching
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/23/3/10.1116/1.1875232
10.1116/1.1875232
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