Schematic illustration of our experimental procedure: (a) spin-coated diblock copolymer film on the substrate surface; (b) after annealing of the diblock copolymer film at ; (c) after VUV irradiation for at ; (d) AHAPS-organosilane film prepared on both the nanopore and PS regions; (e) after toluene treatment for ; (f) immobilization of Pd(II) particles onto the AHAPS-film on the nanopore regions; and (g) after area-selective electroless plating of Cu.
AFM images of the diblock copolymer film before VUV irradiation: (a) topographic image and (b) phase image.
AFM images of the diblock copolymer film after VUV irradiation: (a) after and (b) after .
AFM images of the fabricated Cu nanodots: (a) two-dimensional image and (b) three-dimensional image.
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