Effect of stress and density on the electrical and physical properties of MgO protecting layer for alternating current-plasma display panels
Stress variation of MgO films deposited with the constant deposition rate, , as a function of deposition temperature.
(a) Variation in discharge voltage of ac-PDP with MgO protective film deposited with the constant rate, , as a function of deposition temperature.
XRD patterns of MgO films deposited in various deposition temperatures: (a) , (b) , (c) , (d) , (e) room temperature at , (f) room temperature at , and (g) room temperature at .
Plan and cross-sectional SEM images of MgO film deposited in (a), (b) room temperature, (c), (d) , (e), (f) , (g), (h) at , and (i), (j) room temperature at .
(a) Density of MgO thin films, measured by a gravimetrical method, as a function of deposition temperature. (b) Relation between the stresses of MgO films and the density of the film (∎) and between the reduced firing voltages and the density of the film (▴).
In situ stress variation of MgO film deposited in: (a) room temperature and (b) , as a function of the measured temperature.
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