Properties of transparent conductive :Mo thin films deposited by Channel Spark Ablation
Schematic diagram of CSA apparatus.
XRD pattern of IMO film deposited at and . The inset is a normalized standard XRD pattern of from JCPDS file No. 76-0152 for comparison.
morphology image of typical IMO film taken by AFM at atomic force of 2 nN.
Transmission spectra of IMO thin films with glass substrates deposited at in the wavelength range of 200–900 nm.
Resistivity and the carrier concentration of thin films as a function of oxygen pressure at substrate temperature .
UPS He I spectrum of IMO thin film. Ni is used as the reference of Fermi level.
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