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Reactive magnetron sputtering of hard Si–B–C–N films with a high-temperature oxidation resistance
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10.1116/1.2049298
/content/avs/journal/jvsta/23/6/10.1116/1.2049298
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/23/6/10.1116/1.2049298
/content/avs/journal/jvsta/23/6/10.1116/1.2049298
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/content/avs/journal/jvsta/23/6/10.1116/1.2049298
2005-10-17
2014-11-28
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Reactive magnetron sputtering of hard Si–B–C–N films with a high-temperature oxidation resistance
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/23/6/10.1116/1.2049298
10.1116/1.2049298
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